Peter Przybylski
6Patents
1h-index
12Co-inventors
37Inventor score
Filing activity: May 5, 2014 → May 31, 2017
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9765239B2 | Use of a chemical-mechanical polishing (CMP) composition for polishing a substrate or layer containing at least one III-V material | Electricity | 2 | Active |
| US9828527B2 | Chemical-mechanical polishing compositions comprising N,N,N′,N′-tetrakis-(2-hydroxypropyl)-ethylenediamine or methanesulfonic acid | Electricity | 1 | Active |
| US9862862B2 | Chemical-mechanical polishing compositions comprising polyethylene imine | Electricity | 0 | Active |
| US10865361B2 | Composition for post chemical-mechanical-polishing cleaning | Chemistry; Metallurgy | 0 | Active |
| US10844325B2 | Composition for post chemical-mechanical-polishing cleaning | Chemistry; Metallurgy | 0 | Active |
| US10090159B2 | Chemical-mechanical polishing compositions comprising one or more polymers selected from the group consisting of N-vinyl-homopolymers and N-vinyl copolymers | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.