Raymond Joy
7Patents
5h-index
30Co-inventors
59Inventor score
Filing activity: Mar 26, 1998 → May 31, 2013
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6730573B1 | MIM and metal resistor formation at CU beol using only one extra mask | Electricity | 52 | Expired |
| US8177993B2 | Apparatus and methods for cleaning and drying of wafers | Electricity | 27 | Active |
| US7601607B2 | Protruded contact and insertion of inter-layer-dielectric material to match damascene hardmask to improve undercut for low-k interconnects | Electricity | 7 | Active |
| US6271115A | Post metal etch photoresist strip method | Electricity | 7 | Expired |
| US8987827B2 | Prevention of faceting in epitaxial source drain transistors | Electricity | 5 | Active |
| US7352064B2 | Multiple layer resist scheme implementing etch recipe particular to each layer | Electricity | 4 | Expired |
| US6548413B1 | Method to reduce microloading in metal etching | Electricity | 1 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.