Ron Weimer
8Patents
3h-index
11Co-inventors
50Inventor score
Filing activity: Aug 30, 2000 → Oct 19, 2011
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6458714B1 | Method of selective oxidation in semiconductor manufacture | Electricity | 25 | Expired |
| US6429070B1 | DRAM cell constructions, and methods of forming DRAM cells | Emerging Cross-Sectional Technologies | 20 | Expired |
| US6734062B2 | Methods of forming DRAM cells | Emerging Cross-Sectional Technologies | 8 | Expired |
| US8058140B2 | Thickened sidewall dielectric for memory cell | Electricity | 3 | Active |
| US7705389B2 | Thickened sidewall dielectric for memory cell | Electricity | 3 | Active |
| US6639243B2 | DRAM cell constructions | Emerging Cross-Sectional Technologies | 2 | Expired |
| US6707090B2 | DRAM cell constructions | Emerging Cross-Sectional Technologies | 2 | Expired |
| US8643082B2 | Thickened sidewall dielectric for memory cell | Electricity | 2 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.