Ronald N. Schulz
6Patents
6h-index
11Co-inventors
56Inventor score
Filing activity: Dec 12, 1983 → Nov 8, 1994
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US4648937A | Method of preventing asymmetric etching of lines in sub-micrometer range sidewall images transfer | Emerging Cross-Sectional Technologies | 231 | Expired |
| US5258318A | Method of forming a BiCMOS SOI wafer having thin and thick SOI regions of silicon | Emerging Cross-Sectional Technologies | 49 | Expired |
| US5128271A | High performance vertical bipolar transistor structure via self-aligning processing techniques | Emerging Cross-Sectional Technologies | 43 | Expired |
| US5267418A | Confined water fixture for holding wafers undergoing chemical-mechanical polishing | Performing Operations; Transporting | 32 | Expired |
| US4475982A | Deep trench etching process using CCl.sub.2 F.sub.2 /Ar and CCl.sub.2 F.sub. /O.sub.2 RIE | Electricity | 17 | Expired |
| USD377108S | Bill guard for a cap | General | 14 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.