Sandra Hyland
9Patents
5h-index
17Co-inventors
56Inventor score
Filing activity: May 31, 2001 → Jul 16, 2014
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7226868B2 | Method of etching high aspect ratio features | Electricity | 37 | Expired |
| US7723237B2 | Method for selective removal of damaged multi-stack bilayer films | Electricity | 9 | Active |
| US7461614B2 | Method and apparatus for improved baffle plate | Electricity | 8 | Expired |
| US7432191B1 | Method of forming a dual damascene structure utilizing a developable anti-reflective coating | Electricity | 8 | Active |
| US6376262B1 | Method of forming a semiconductor device using double endpoint detection | Electricity | 6 | Expired |
| US7883835B2 | Method for double patterning a thin film | Electricity | 0 | Active |
| US8580075B2 | Method and system for introduction of an active material to a chemical process | Emerging Cross-Sectional Technologies | 0 | Active |
| US9255345B2 | Method for growing germanium/silicon—germanium superlattice | Electricity | 0 | Active |
| US7811747B2 | Method of patterning an anti-reflective coating by partial developing | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.