Apparatus and method for UV treatment, chemical treatment, and deposition
US10570517B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 16, 2016 |
| Grant date | Feb 25, 2020 |
| Priority date | — |
| Expiry date | Mar 31, 2037 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/481
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Embodiments of the present invention provide apparatus and methods for performing UV treatment and chemical treatment and/or deposition in the same chamber. One embodiment of the present invention provides a processing chamber including a UV transparent gas distribution showerhead disposed above a substrate support located in an inner volume of the processing chamber, a UV transparent window disposed above the UV transparent gas distribution showerhead, and a UV unit disposed outside the inner volume. The UV unit is configured to direct UV lights towards the substrate support through the UV transparent window and the UV transparent gas distribution showerhead.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.