Systems and methods for modifying a reticle's optical properties
US7303842B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 31, 2006 |
| Grant date | Dec 4, 2007 |
| Priority date | — |
| Expiry date | Mar 31, 2026 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/146
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Disclosed are systems and methods for modifying a reticle. In general, inspection results from a plurality of wafers or prediction results from a lithographic model are used to individually decrease the dose or any other optical property at specific locations of the reticle. In one embodiment, any suitable optical property of the reticle is modified by an optical beam, such as a femto-second laser, at specific locations on the reticle so as to widen the process window for such optical property. Examples of optical properties include dose, phase, illumination angle, and birefringence. Techniques for adjusting optical properties at specific locations on a reticle using an optical beam may be practiced for other purposes besides widening the process window.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.