Inventor · Yorktown Heights, NY, US

Steven E. Molis

16Patents
9h-index
56Co-inventors
75Inventor score

Filing activity: Jul 13, 1988 → Feb 25, 2013

Most-cited inventions

PatentTitleAreaCited byStatus
US5019210A Method for enhancing the adhesion of polymer surfaces by water vapor plasma treatment Emerging Cross-Sectional Technologies 28 Expired
US5591285A Fluorinated carbon polymer composites Emerging Cross-Sectional Technologies 27 Expired
US8420531B2 Enhanced diffusion barrier for interconnect structures Electricity 26 Active
US5397863A Fluorinated carbon polymer composites Emerging Cross-Sectional Technologies 25 Expired
US6149840A Electrically conductive polymeric materials and use thereof Chemistry; Metallurgy 23 Expired
US5556899A Fluorinated carbon polymer composites Emerging Cross-Sectional Technologies 22 Expired
US4846929A Wet etching of thermally or chemically cured polyimide Electricity 17 Expired
US5571852A Fluorinated carbon polymer composites Emerging Cross-Sectional Technologies 15 Expired
US7838428B2 Method of repairing process induced dielectric damage by the use of GCIB surface treatment using gas clusters of organic molecular species Electricity 12 Active
US8742581B2 Enhanced diffusion barrier for interconnect structures Electricity 9 Active
US6168732A Electrically conductive polymeric materials and use thereof Chemistry; Metallurgy 4 Expired
US7615482B2 Structure and method for porous SiCOH dielectric layers and adhesion promoting or etch stop layers having increased interfacial and mechanical strength Emerging Cross-Sectional Technologies 4 Active
US9040390B2 Releasable buried layer for 3-D fabrication and methods of manufacturing Emerging Cross-Sectional Technologies 1 Active
US7585431B1 Electrically conductive polymeric materials and use thereof Chemistry; Metallurgy 1 Expired
US7932342B2 Method to improve wettability by reducing liquid polymer macromolecule mobility through forming polymer blend system Chemistry; Metallurgy 0 Active
US7737029B2 Methods of forming metal interconnect structures on semiconductor substrates using oxygen-removing plasmas and interconnect structures formed thereby Electricity 0 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.