Takehiko Ueda
26Patents
10h-index
31Co-inventors
75Inventor score
Filing activity: Apr 7, 1976 → Mar 17, 2021
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6271047A | Layer-thickness detection methods and apparatus for wafers and the like, and polishing apparatus comprising same | Electricity | 147 | Expired |
| US6670200B2 | Layer-thickness detection methods and apparatus for wafers and the like, and polishing apparatus comprising same | Electricity | 91 | Expired |
| US6489624B1 | Apparatus and methods for detecting thickness of a patterned layer | Physics | 68 | Expired |
| US7052920B2 | Layer-thickness detection methods and apparatus for wafers and the like, and polishing apparatus comprising same | Electricity | 56 | Expired |
| US6180472A | Method for fabricating semiconductor device | Emerging Cross-Sectional Technologies | 26 | Expired |
| US6492665B1 | Semiconductor device | Emerging Cross-Sectional Technologies | 18 | Expired |
| US4476219A | Silver halide color photographic material | Physics | 16 | Expired |
| US4141730A | Multilayer color photographic materials | Physics | 15 | Expired |
| US5486993A | Controlling apparatus for high frequency high voltage power source for corona discharge processing | Emerging Cross-Sectional Technologies | 14 | Expired |
| US6963407B2 | Process end point detection apparatus and method, polishing apparatus, semiconductor device manufacturing method, and recording medium recorded with signal processing program | Performing Operations; Transporting | 10 | Expired |
| US7169016B2 | Chemical mechanical polishing end point detection apparatus and method | Performing Operations; Transporting | 6 | Expired |
| US4789624A | Silver halide color photographic light-sensitive material | Physics | 5 | Expired |
| US6556179B2 | Display device and camera having the display device | Physics | 4 | Expired |
| US5933181A | Photographic recording apparatus | Physics | 4 | Expired |
| US7686673B2 | Working shape prediction method, working requirement determination method, working method, working system, method of manufacturing semiconductor device, computer program, and computer program storage medium | Electricity | 3 | Expired |
| US7981309B2 | Method for detecting polishing end in CMP polishing device, CMP polishing device, and semiconductor device manufacturing method | Electricity | 1 | Active |
| US10722264B2 | Medical puncture needle and method for manufacturing puncture needle | Human Necessities | 0 | Active |
| US11033691B2 | Medical puncture needle | Human Necessities | 0 | Active |
| US6051444A | Method of manufacture of liquid crystal display device having characteristics which differ locally | Physics | 0 | Expired |
| US9031687B2 | Method for predicting worked shape, method for determining working conditions, working method, working system, semiconductor device manufacturing method, computer program and computer program storage medium | Electricity | 0 | Active |
| US11517667B2 | Puncture needle | Human Necessities | 0 | Active |
| US10429402B2 | Washing/drying apparatus, screening apparatus, washing/drying method, and screening method | Physics | 0 | Active |
| US12138434B2 | Puncture needle and catheter assembly | Human Necessities | 0 | Active |
| US10682473B2 | Medical puncture needle and method for manufacturing puncture needle | Performing Operations; Transporting | 0 | Active |
| US12158736B2 | Electronic apparatus activation control apparatus, electronic apparatus activation control system, electronic apparatus activation control method, and program | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.