Thomas Tillocher
4Patents
1h-index
16Co-inventors
41Inventor score
Filing activity: Apr 3, 2008 → Dec 10, 2021
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8012365B2 | Deep anisotropic silicon etch method | Performing Operations; Transporting | 2 | Active |
| US12131914B2 | Selective etching with fluorine, oxygen and noble gas containing plasmas | Electricity | 0 | Active |
| US12249515B2 | Etching method and etching apparatus | Electricity | 0 | Active |
| US11120999B2 | Plasma etching method | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.