Wanjae Park
4Patents
1h-index
13Co-inventors
41Inventor score
Filing activity: Jul 14, 2007 → Dec 14, 2018
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7816271B2 | Methods for forming contacts for dual stress liner CMOS semiconductor devices | Electricity | 5 | Active |
| US10460963B2 | Plasma processing method | Electricity | 1 | Active |
| US11243465B2 | Plasma treatment method to enhance surface adhesion for lithography | Electricity | 0 | Active |
| US10460988B2 | Removal method and processing method | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.