Yoshimitsu Kon
5Patents
1h-index
11Co-inventors
44Inventor score
Filing activity: Dec 28, 2006 → Feb 21, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8128831B2 | Plasma etching method and computer-readable storage medium | Electricity | 42 | Active |
| US8216485B2 | Plasma etching method, plasma etching apparatus, control program and computer-readable storage medium | Electricity | 1 | Active |
| US11121001B2 | Method of etching, device manufacturing method, and plasma processing apparatus | Electricity | 0 | Active |
| US11264248B2 | Etching method and substrate processing apparatus | Electricity | 0 | Active |
| US12394632B2 | Plasma processing method and plasma processing system | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.