Yuta NAKANE
4Patents
0h-index
9Co-inventors
24Inventor score
Filing activity: Sep 9, 2020 → Mar 22, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US11476123B2 | Etching method, plasma processing apparatus, and substrate processing system | Electricity | 0 | Active |
| US12112954B2 | Etching method, substrate processing apparatus, and substrate processing system | Electricity | 0 | Active |
| US12431335B2 | Substrate processing method and substrate processing apparatus | Electricity | 0 | Active |
| US12100578B2 | Substrate processing method | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.