Particle reduction via throttle gate valve purge

US10010912B2 · kind B2 · utility

Assignee

• Applied Materials, Inc. · US

Inventors

• Jared Ahmad Lee · Santa Clara, US
• Dmitry Lubomirsky · Cupertino, US
• Martin Jeff Salinas · San Jose, US
• Andrew Nguyen · San Jose, US
• Tom K. Cho · Palo Alto, US
• Eric A. Englhardt · Palo Alto, US
• Fernando Silveira · Livermore, US

Key dates

• Filing date: May 13, 2014
• Grant date: Jul 3, 2018
• Expiry date: Feb 3, 2035

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10T137/4259
• WIPO field: Mechanical elements
• WIPO sector: Mechanical engineering

Abstract

Methods and apparatus for particle reduction in throttle gate valves used in substrate process chambers are provided herein. In some embodiments, a gate valve for use in a process chamber includes a body having an opening disposed therethrough from a first surface to an opposing second surface of the body; a pocket extending into the body from a sidewall of the opening; a gate movably disposed within the pocket between a closed position that seals the opening and an open position that reveals the opening and disposes the gate completely within the pocket; and a plurality of gas ports disposed in the gate valve configured to direct a gas flow into a portion of the gate valve fluidly coupled to the opening.