Method and apparatus for substrate transfer and radical confinement
US10090181B2 · kind B2 · utility
9Cited by
7References
15Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 29, 2012 |
| Grant date | Oct 2, 2018 |
| Priority date | — |
| Expiry date | Oct 20, 2035 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67751
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Embodiments of the present invention provide an apparatus for transferring substrates and confining a processing environment in a chamber. One embodiment of the present invention provides a hoop assembly for using a processing chamber. The hoop assembly includes a confinement ring defining a confinement region therein, and three or more lifting fingers attached to the hoop. The three or more lifting fingers are configured to support a substrate outside the inner volume of the confinement ring.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.