System and method for performing nano beam diffraction analysis
US10109455B2 · kind B2 · utility
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5References
20Claims
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Key dates
| Filing date | Feb 28, 2018 |
| Grant date | Oct 23, 2018 |
| Priority date | — |
| Expiry date | Feb 28, 2038 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/31745
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A system for performing diffraction analysis, includes a focused ion beam (FIB) device for preparing a sample, a mill for removing a surface portion of the prepared sample, and an analyzer for performing diffraction analysis on the milled sample.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.