Systems for providing illumination in optical metrology

US10203247B2 · kind B2 · utility

Assignee

• KLA-TENCOR CORPORATION · US

Inventors

• Gregory Brady · San Jose, US
• Andrei V. Shchegrov · Campbell, US
• Lawrence D. Rotter · Pleasanton, US
• Derrick Shaughnessy · San Jose, US
• Anatoly Shchemelinin · Pleasanton, US
• Ilya Bezel · Mountain View, US
• Muzammil Arain · Milpitas, US
• Anatoly A. Vasiliev · Sunnyvale, US
• James Andrew Allen · Elk Grove, US
• Oleg Shulepov · San Jose, US
• Andrew V. Hill · Chino Hills, US
• Ohad Bachar · Timrat, IL
• Moshe Markowitz · Haifa, IL
• Yaron Ish-Shalom · Kiryat Tivon, IL
• Ilan Sela · Haifa, IL
• Amnon Manassen · Haifa, IL
• Alexander Svizher · Haifa, IL
• Maxim Khokhlov · Haifa, IL
• Avi Abramov · Haifa, IL
• Oleg Tsibulevsky · Migdal HaEmek, IL
• Daniel Kandel · Aseret, IL
• Mark Ghinovker · Migdal HaEmek, IL

Key dates

• Filing date: Dec 5, 2016
• Grant date: Feb 12, 2019
• Expiry date: Dec 5, 2036

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01J65/04
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A system for providing illumination to a measurement head for optical metrology is configured to combine illumination beams from a plurality of illumination sources to deliver illumination at one or more selected wavelengths to the measurement head. The intensity and/or spatial coherence of illumination delivered to the measurement head is controlled. Illumination at one or more selected wavelengths is delivered from a broadband illumination source configured for providing illumination at a continuous range of wavelengths.