Method and system for determining strain distribution in a sample
US10209206B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 8, 2014 |
| Grant date | Feb 19, 2019 |
| Priority date | — |
| Expiry date | Apr 25, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2223/611
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A control system is presented for use in measuring one or more parameters of a sample. The control system comprises an input utility and a processor utility. The input utility is configured for receiving input data including first data comprising X-ray Diffraction or High-Resolution X-ray Diffraction (XRD) response data of the sample indicative of a material distribution in the sample, and second data comprising optical response data of the sample to incident light indicative of at least a geometry of the sample. The processor utility is configured and operable for processing and analyzing one of the first and second data for optimizing the other one of the first and second data, and utilizing the optimized data for determining said one or more parameters of the sample including a strain distribution in the sample.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.