Membranes for use within a lithographic apparatus and a lithographic apparatus comprising such a membrane
US10228615B2 · kind B2 · utility
9Cited by
3References
28Claims
0Family size
Assignee
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Key dates
| Filing date | Jul 2, 2015 |
| Grant date | Mar 12, 2019 |
| Priority date | — |
| Expiry date | Oct 8, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70983
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A membrane transmissive to EUV radiation, which may be used as a pellicle or spectral filter in a lithographic apparatus. The membrane includes one or more high doped regions wherein the membrane is doped with a dopant concentration greater than 1017 cm−3, and one or more regions with low (or no) doping. The membrane may have a main substrate having low doping and one or more additional layers, wherein the high doped regions are comprised within some or all of the additional layers.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.