Clean resistant windows for ultraviolet thermal processing
US10240236B2 · kind B2 · utility
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34References
20Claims
0Family size
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Key dates
| Filing date | Mar 6, 2015 |
| Grant date | Mar 26, 2019 |
| Priority date | — |
| Expiry date | Aug 18, 2036 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB08B9/00
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Apparatuses and methods for cleaning a semiconductor processing chamber is provided. The semiconductor processing chamber may include a UV radiation source, a substrate holder, and a UV transmissive window. The UV transmissive window may include one or multiple panes. One or more panes of the UV transmissive window may be non-reactive with fluorine containing chemistries. In multi-pane windows a purge gas flow path may be formed in the gap between windows. A purge gas may be flowed through the purge gas flow path to prevent process gases used in the chamber interior from reaching one or more panes of the UV transmissive window.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.