Near field metrology

US10261014B2 · kind B2 · utility

Assignee

• KLA-TENCOR CORPORATION · US

Inventors

• Noam Sapiens · Cupertino, US
• Joel Seligson · Kiryat Shmona, IL
• Vladimir Levinski · Milpitas, US
• Daniel Kandel · Aseret, IL
• Yoel Feler · Haifa, IL
• Barak Bringoltz · Rehovot, IL
• Amnon Manassen · Haifa, IL
• Eliav Benisty · Migdal HaEmek, IL

Key dates

• Filing date: Dec 26, 2014
• Grant date: Apr 16, 2019
• Expiry date: Dec 26, 2034

Classification

• Technology area (CPC G): Physics
• CPC primary: G01N2201/06113
• WIPO field: Measurement
• WIPO sector: Instruments

Abstract

Metrology systems and methods are provided herein, which comprise an optical element that is positioned between an objective lens of the system and a target. The optical element is arranged to enhance evanescent modes of radiation reflected by the target. Various configurations are disclosed: the optical element may comprise a solid immersion lens, a combination of Moiré-elements and solid immersion optics, dielectric-metal-dielectric stacks of different designs, and resonating elements to amplify the evanescent modes of illuminating radiation. The metrology systems and methods are configurable to various metrology types, including imaging and scatterometry methods.