Susceptor design to reduce edge thermal peak

US10269614B2 · kind B2 · utility

Assignee

• Applied Materials, Inc. · US

Inventors

• Schubert S. Chu · San Francisco, US
• Kartik Shah · Saratoga, US
• Anhthu Ngo · San Jose, US
• Karthik Ramanathan · Survanagiri, IN
• Nitin Pathak · Mumbai, IN
• Nyi O. Myo · San Jose, US
• Paul Brillhart · Pleasanton, US
• Richard O. Collins · Santa Clara, US
• Kevin Joseph Bautista · San Jose, US
• Edric Tong · Sunnyvale, US
• Zhepeng CONG · San Jose, US
• Anzhong Chang · San Jose, US
• Kin Pong Lo · Fremont, US
• Manish Hemkar · Sunnyvale, US

Key dates

• Filing date: Oct 16, 2015
• Grant date: Apr 23, 2019
• Expiry date: May 14, 2037

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01L21/67115
• WIPO field: Semiconductors
• WIPO sector: Electrical engineering

Abstract

Implementations of the present disclosure generally relate to a susceptor for thermal processing of semiconductor substrates. In one implementation, the susceptor includes a first rim surrounding and coupled to an inner region, and a second rim disposed between the inner rim and the first rim. The second rim includes an angled support surface having a plurality of cut-outs formed therein, and the angled support surface is inclined with respect to a top surface of the inner region.