Optimization of source and bandwidth for new and existing patterning devices
US10416566B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Nov 30, 2016 |
| Grant date | Sep 17, 2019 |
| Priority date | — |
| Expiry date | Nov 30, 2036 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70625
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method to improve a lithographic process of imaging a portion of a design layout onto a substrate using a lithographic apparatus, the method including: computing a multi-variable cost function, the multi-variable cost function being a function a plurality of design variables that represent characteristics of the lithographic process; and reconfiguring one or more of the characteristics of the lithographic process by adjusting one or more of the design variables until a certain termination condition is satisfied; wherein a bandwidth of a radiation source of the lithographic apparatus is allowed to change during the reconfiguration.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.