Patent · US Active

Method for processing a workpiece using a multi-cycle thermal treatment process

US10573532B2 · kind B2 · utility

1Cited by
7References
14Claims
0Family size

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Key dates

Filing dateJun 27, 2018
Grant dateFeb 25, 2020
Priority date
Expiry dateJun 27, 2038

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L21/67103
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

A method for processing a workpiece is provided. The method can include placing a workpiece on a susceptor disposed within a processing chamber. The method can include performing a multi-cycle thermal treatment process on the workpiece in the processing chamber. The multi-cycle thermal treatment process can include at least two thermal cycles. Each thermal cycle of the at least two thermal cycles can include performing a first treatment on the workpiece at a first temperature; heating a device side surface of the workpiece to a second temperature in less than one second; performing a second treatment on the workpiece at approximately the second temperature; and cooling the workpiece subsequent to performing the second treatment.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.