Patent · US Active

Symmetric target design in scatterometry overlay metrology

US10591406B2 · kind B2 · utility

4Cited by

34References

20Claims

0Family size

Assignee

KLA-TENCOR CORPORATION · US

Inventors

Barak Bringoltz · Rehovot, IL
Daniel Kandel · Aseret, IL
Yoel Feler · Haifa, IL
Noam Sapiens · Cupertino, US
Paykin Irina · Haifa, IL
Alexander Svizher · Haifa, IL
Meir Aloni · Herzliya, IL
Guy Ben Dov · Haifa, IL
Hadar Shalmoni · Nes Ziona, IL
Vladimir Levinski · Milpitas, US

Key dates

Filing date	Apr 6, 2016
Grant date	Mar 17, 2020
Priority date	—
Expiry date	Apr 6, 2036

Classification

Technology area (CPC G)Physics
CPC primaryG01N2201/068
WIPO fieldMeasurement
WIPO sectorInstruments

Abstract

Metrology methods, systems and targets are provided, which implement a side by side paradigm. Adjacent cells with periodic structures are used to extract the overlay error, e.g., by introducing controllable phase shifts or image shifts which enable algorithmic computation of the overlay. The periodic structures are designed to exhibit a rotational symmetry to support the computation and reduce errors.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.