Multi zone gas injection upper electrode system
US10622195B2 · kind B2 · utility
2Cited by
46References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 3, 2012 |
| Grant date | Apr 14, 2020 |
| Priority date | — |
| Expiry date | Nov 8, 2035 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67109
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A system and method of plasma processing includes a plasma processing system including a plasma chamber and a controller coupled to the plasma chamber. The plasma chamber including a substrate support and an upper electrode opposite the substrate support, the upper electrode having a plurality of concentric gas injection zones.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.