System and method for performing nano beam diffraction analysis
US10658154B2 · kind B2 · utility
0Cited by
5References
18Claims
0Family size
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Key dates
| Filing date | Jul 31, 2018 |
| Grant date | May 19, 2020 |
| Priority date | — |
| Expiry date | Jul 31, 2038 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/31745
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A system for performing diffraction analysis, includes a mill for removing a surface portion of a sample, and an analyzer for performing diffraction analysis on the milled sample.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.