Substrate processing system, valve assembly, and processing method
US10665476B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 18, 2014 |
| Grant date | May 26, 2020 |
| Priority date | — |
| Expiry date | Sep 18, 2036 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T137/0318
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
In one aspect, a valve assembly adapted to seal an opening in a chamber is disclosed. Valve assembly includes a housing being adapted for coupling to a chamber surface having the opening therein, the housing including a threshold portion positioned adjacent to the chamber opening, the threshold portion having one or more inlets adapted to supply gas to an interior region of the housing adjacent to the chamber opening; and a sealing surface adapted to selectively (1) seal the opening, and (2) retract from the opening so as not to obstruct substrate passage. Numerous other system aspects are provided, as are methods and computer program products in accordance with these and other aspects.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.