RPS defect reduction by cyclic clean induced RPS cooling
US10755903B2 · kind B2 · utility
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4References
20Claims
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Key dates
| Filing date | Jan 4, 2017 |
| Grant date | Aug 25, 2020 |
| Priority date | — |
| Expiry date | May 29, 2037 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/3321
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A method of cleaning a remote plasma source includes supplying a first cycle of one or more first cleaning gases to a remote plasma source. The method includes supplying a second cycle of one or more second cleaning gases to the remote plasma source. The method includes supplying one or more cooling fluids to one or more cooling conduits coupled with the remote plasma source.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.