Tunable ground planes in plasma chambers
US10774423B2 · kind B2 · utility
37Cited by
21References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 24, 2014 |
| Grant date | Sep 15, 2020 |
| Priority date | — |
| Expiry date | Dec 31, 2036 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32541
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An apparatus and method are provided for controlling the intensity and distribution of a plasma discharge in a plasma chamber. In one embodiment, a shaped electrode is embedded in a substrate support to provide an electric field with radial and axial components inside the chamber. In another embodiment, the face plate electrode of the showerhead assembly is divided into zones by isolators, enabling different voltages to be applied to the different zones. Additionally, one or more electrodes may be embedded in the chamber side walls.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.