Thomas Nowak
56Patents
17h-index
112Co-inventors
87Inventor score
Filing activity: Aug 14, 1987 → Feb 13, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6329297A | Dilute remote plasma clean | Emerging Cross-Sectional Technologies | 653 | Expired |
| US6863019B2 | Semiconductor device fabrication chamber cleaning method and apparatus with recirculation of cleaning gas | Emerging Cross-Sectional Technologies | 549 | Expired |
| US7566891B2 | Apparatus and method for treating a substrate with UV radiation using primary and secondary reflectors | Performing Operations; Transporting | 523 | Active |
| US8492170B2 | UV assisted silylation for recovery and pore sealing of damaged low K films | Electricity | 506 | Active |
| US8911553B2 | Quartz showerhead for nanocure UV chamber | Emerging Cross-Sectional Technologies | 457 | Active |
| US7692171B2 | Apparatus and method for exposing a substrate to UV radiation using asymmetric reflectors | Physics | 451 | Active |
| US8338809B2 | Ultraviolet reflector with coolant gas holes and method | Physics | 391 | Active |
| US9157730B2 | PECVD process | Physics | 46 | Active |
| US6366346B1 | Method and apparatus for optical detection of effluent composition | Electricity | 39 | Expired |
| US10774423B2 | Tunable ground planes in plasma chambers | Electricity | 37 | Active |
| US7572337B2 | Blocker plate bypass to distribute gases in a chemical vapor deposition system | Electricity | 28 | Active |
| US8203126B2 | Apparatus and method for exposing a substrate to a rotating irradiance pattern of UV radiation | Electricity | 26 | Active |
| US7663121B2 | High efficiency UV curing system | Electricity | 23 | Active |
| US8197636B2 | Systems for plasma enhanced chemical vapor deposition and bevel edge etching | Electricity | 22 | Active |
| US4874277A | Wall fastener and method of fabrication | Mechanical Engineering; Lighting; Heating | 21 | Expired |
| US7589336B2 | Apparatus and method for exposing a substrate to UV radiation while monitoring deterioration of the UV source and reflectors | Performing Operations; Transporting | 21 | Active |
| US7777198B2 | Apparatus and method for exposing a substrate to a rotating irradiance pattern of UV radiation | Electricity | 19 | Active |
| US4941340A | Method of fabricating wall fasteners | Mechanical Engineering; Lighting; Heating | 15 | Expired |
| US7628863B2 | Heated gas box for PECVD applications | Electricity | 13 | Expired |
| US7909595B2 | Apparatus and method for exposing a substrate to UV radiation using a reflector having both elliptical and parabolic reflective sections | Performing Operations; Transporting | 12 | Active |
| US8216861B1 | Dielectric recovery of plasma damaged low-k films by UV-assisted photochemical deposition | Electricity | 11 | Active |
| US7964858B2 | Ultraviolet reflector with coolant gas holes and method | Physics | 11 | Active |
| US8274017B2 | Multifunctional heater/chiller pedestal for wide range wafer temperature control | Electricity | 11 | Active |
| US9458537B2 | PECVD process | Physics | 8 | Active |
| US8283237B2 | Fabrication of through-silicon vias on silicon wafers | Electricity | 8 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.