Inventor · Los Gatos, CA, US

Dale R. Du Bois

38Patents
8h-index
69Co-inventors
78Inventor score

Filing activity: Apr 25, 1991 → Apr 2, 2020

Most-cited inventions

PatentTitleAreaCited byStatus
US7566891B2 Apparatus and method for treating a substrate with UV radiation using primary and secondary reflectors Performing Operations; Transporting 523 Active
US9355876B2 Process load lock apparatus, lift assemblies, electronic device processing systems, and methods of processing substrates in load lock locations Emerging Cross-Sectional Technologies 434 Active
US5326725A Clamping ring and susceptor therefor Electricity 100 Expired
US5320680A Primary flow CVD apparatus comprising gas preheater and means for substantially eddy-free gas flow Chemistry; Metallurgy 39 Expired
US10774423B2 Tunable ground planes in plasma chambers Electricity 37 Active
US8203126B2 Apparatus and method for exposing a substrate to a rotating irradiance pattern of UV radiation Electricity 26 Active
US7777198B2 Apparatus and method for exposing a substrate to a rotating irradiance pattern of UV radiation Electricity 19 Active
US8274017B2 Multifunctional heater/chiller pedestal for wide range wafer temperature control Electricity 11 Active
US6376387B2 Method of sealing an epitaxial silicon layer on a substrate Emerging Cross-Sectional Technologies 7 Expired
US6170433A Method and apparatus for processing a wafer Electricity 7 Expired
US6436194B1 Method and a system for sealing an epitaxial silicon layer on a substrate Electricity 5 Expired
US7922440B2 Apparatus and method for centering a substrate in a process chamber Emerging Cross-Sectional Technologies 4 Active
US8778813B2 Confined process volume PECVD chamber Electricity 4 Active
US6685779B2 Method and a system for sealing an epitaxial silicon layer on a substrate Emerging Cross-Sectional Technologies 2 Expired
US8884524B2 Apparatus and methods for improving reliability of RF grounding Electricity 2 Active
US9593419B2 Wafer rotation in a semiconductor chamber Electricity 2 Active
US10153185B2 Substrate temperature measurement in multi-zone heater Electricity 2 Active
US10281261B2 In-situ metrology method for thickness measurement during PECVD processes Electricity 2 Active
US10570517B2 Apparatus and method for UV treatment, chemical treatment, and deposition Chemistry; Metallurgy 2 Active
US10227695B2 Shadow ring for modifying wafer edge and bevel deposition Electricity 2 Active
US10094486B2 Method and system for supplying a cleaning gas into a process chamber Emerging Cross-Sectional Technologies 1 Active
US9922819B2 Wafer rotation in a semiconductor chamber Electricity 1 Active
US10325799B2 Dual temperature heater Electricity 0 Active
US11031262B2 Loadlock integrated bevel etcher system Electricity 0 Active
US10720349B2 Temperature measurement in multi-zone heater Electricity 0 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.