Method and system for optical characterization of patterned samples
US10876959B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 23, 2018 |
| Grant date | Dec 29, 2020 |
| Priority date | — |
| Expiry date | Jul 23, 2038 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2201/0683
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method and system are presented for use in measuring on patterned samples, aimed at determining asymmetry in the pattern. A set of at least first and second measurements on a patterned region of a sample is performed, where each of the measurements comprises: directing illuminating light onto the patterned region along an illumination channel and collecting light reflected from the illuminated region propagating along a collection channel to be detected, such that detected light from the same patterned region has different polarization states which are different from polarization of the illuminating light, and generating a measured data piece indicative of the light detected in the measurement. Thus, at least first and second measured data pieces are generated for the at least first and second measurements on the same patterned region. The at least first and second measured data pieces are analyzed and output data is generated being indicative of a condition of asymmetry in the patterned region.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.