Chamber with individually controllable plasma generation regions for a reactor for processing a workpiece
US10957518B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 24, 2020 |
| Grant date | Mar 23, 2021 |
| Priority date | — |
| Expiry date | Mar 24, 2040 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/334
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A plasma reactor includes a processing chamber having a lower processing portion having an axis of symmetry and an array of cavities extending upwardly from the lower processing portion. A gas distributor couples plural gas sources to a plurality of gas inlets of the cavities, and the gas distributor includes a plurality of valves with each valve selectively connecting a respective gas inlet to one of the plural gas sources. Power is applied by an array of conductors that includes a respective conductor for each respective cavity with each conductor adjacent and surrounding a cavity. A power distributor couples a power source and the array of conductors, and the power distributor includes a plurality of switches with a switch for each respective conductor.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.