Shutter disk
US11171017B2 · kind B2 · utility
0Cited by
4References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 3, 2020 |
| Grant date | Nov 9, 2021 |
| Priority date | — |
| Expiry date | Sep 3, 2040 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2224/741
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Describes are shutter disks comprising one or more of titanium (Ti), barium (Ba), or cerium (Ce) for physical vapor deposition (PVD) that allows pasting to minimize outgassing and control defects during etching of a substrate. The shutter disks incorporate getter materials that are highly selective to reactive gas molecules, including O2, CO, CO2, and water.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.