Junqi Wei
16Patents
3h-index
16Co-inventors
49Inventor score
Filing activity: Dec 31, 2014 → Nov 21, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| USD913979S1 | Inner shield for a substrate processing chamber | General | 25 | Active |
| USD973609S1 | Upper shield with showerhead for a process chamber | General | 3 | Active |
| USD931241S1 | Lower shield for a substrate processing chamber | General | 3 | Active |
| US12148629B2 | Shutter disk | Electricity | 0 | Active |
| US11670513B2 | Apparatus and systems for substrate processing for lowering contact resistance | Electricity | 0 | Active |
| US11171017B2 | Shutter disk | Electricity | 0 | Active |
| US11913107B2 | Methods and apparatus for processing a substrate | Electricity | 0 | Active |
| US11114288B2 | Physical vapor deposition apparatus | Electricity | 0 | Active |
| USD971167S1 | Lower shield for a substrate processing chamber | General | 0 | Active |
| US12080522B2 | Preclean chamber upper shield with showerhead | Electricity | 0 | Active |
| US12100577B2 | High conductance inner shield for process chamber | Electricity | 0 | Active |
| US11881385B2 | Methods and apparatus for reducing defects in preclean chambers | Electricity | 0 | Active |
| US11862480B2 | Shutter disk | Electricity | 0 | Active |
| US10115573B2 | Apparatus for high compressive stress film deposition to improve kit life | Electricity | 0 | Active |
| US11328929B2 | Methods, apparatuses and systems for substrate processing for lowering contact resistance | Electricity | 0 | Active |
| US9960023B2 | Methods and apparatus for nodule control in a titanium-tungsten target | Chemistry; Metallurgy | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.