Methods for graphene formation using microwave surface-wave plasma on dielectric materials
US11289331B2 · kind B2 · utility
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Key dates
| Filing date | Sep 27, 2019 |
| Grant date | Mar 29, 2022 |
| Priority date | — |
| Expiry date | Sep 27, 2039 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/02658
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A method of forming graphene layers is disclosed. A method of improving graphene deposition is also disclosed. Some methods are advantageously performed at lower temperatures. Some methods advantageously provide graphene layers with lower resistance. Some methods advantageously provide graphene layers in a relatively short period of time.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.