Machine learning-based defect detection of a specimen
US11449711B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 2, 2020 |
| Grant date | Sep 20, 2022 |
| Priority date | — |
| Expiry date | Jun 20, 2040 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2207/30148
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
There is provided a method of defect detection on a specimen and a system thereof. The method includes: obtaining a runtime image representative of at least a portion of the specimen; processing the runtime image using a supervised model to obtain a first output indicative of the estimated presence of first defects on the runtime image; processing the runtime image using an unsupervised model component to obtain a second output indicative of the estimated presence of second defects on the runtime image; and combining the first output and the second output using one or more optimized parameters to obtain a defect detection result of the specimen.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.