Joint opening structures of three-dimensional memory devices and methods for forming the same
US11482532B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 18, 2020 |
| Grant date | Oct 25, 2022 |
| Priority date | — |
| Expiry date | Jan 1, 2041 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10B43/35
Abstract
Joint opening structures of 3D memory devices and fabricating method are provided. A joint opening structure comprises a first through hole penetrating a first stacked layer and a first insulating connection layer, a first channel structure at the bottom of the first through hole, a first functional layer on the sidewall of the first through hole, a second channel structure on the sidewall of the first functional layer, a third channel structure over the first through hole, a second stacked layer on the third channel structure, a second insulating connection layer on the second stacked layer, a second through hole penetrating the second stacked layer and the second insulating connection layer, a second functional layer disposed on the sidewall of the second through hole, a fourth channel structure on the sidewall of the second functional layer, and a fifth channel structure over the second through hole.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.