Patent · US Active

Apparatus for post exposure bake

US11550224B2 · kind B2 · utility

1Cited by

14References

20Claims

0Family size

Assignee

Applied Materials, Inc. · US

Inventors

Kyle M. Hanson · Kalispell, US
Gregory J. Wilson · Kalispell, US
Viachslav Babayan · Sunnyvale, US

Key dates

Filing date	Aug 24, 2020
Grant date	Jan 10, 2023
Priority date	—
Expiry date	Nov 4, 2040

Classification

Technology area (CPC H)Electricity
CPC primaryH01L21/67751
WIPO fieldSemiconductors
WIPO sectorElectrical engineering

Abstract

Embodiments described herein relate to methods and apparatus for performing immersion field guided post exposure bake processes. Embodiments of apparatus described herein include a chamber body defining a processing volume. Electrodes may be disposed adjacent the process volume and process fluid is provided to the process volume via a plurality of fluid conduits to facilitate immersion field guided post exposure bake processes. A post process chamber for rinsing, developing, and drying a substrate is also provided.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.