High temperature dual chamber showerhead

US11555244B2 · kind B2 · utility

Assignee

• Applied Materials, Inc. · US

Inventors

• Pingyan Lei · San Jose, US
• Dien-Yeh Wu · San Jose, US
• Jallepally Ravi · Santa Clara, US
• Takashi Kuratomi · San Jose, US
• Xiaoxiong Yuan · Cupertino, US
• Manjunatha Koppa · Kanchinakote, IN
• Vinod Konda Purathe · Bengaluru, IN

Key dates

• Filing date: Oct 23, 2020
• Grant date: Jan 17, 2023
• Expiry date: Oct 23, 2040

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C23C16/45574
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

Embodiments of showerheads are provided herein. In some embodiments, a showerhead for use in a process chamber includes a gas distribution plate having an upper surface and a lower surface; a plurality of channels extending through the gas distribution plate substantially perpendicular to the lower surface; a plurality of first gas delivery holes extending from the upper surface to the lower surface between adjacent channels of the plurality of channels to deliver a first process gas through the gas distribution plate; and a plurality of second gas delivery holes extending from the plurality of channels to the lower surface to deliver a second process gas therethrough without mixing with the first process gas.