Inventor · Santa Clara, CA, US

Jallepally Ravi

30Patents
7h-index
59Co-inventors
72Inventor score

Filing activity: Oct 21, 1997 → Mar 8, 2024

Most-cited inventions

PatentTitleAreaCited byStatus
US6620670B2 Process conditions and precursors for atomic layer deposition (ALD) of AL2O3 Electricity 165 Expired
US7572052B2 Method for monitoring and calibrating temperature in semiconductor processing chambers Electricity 62 Active
US6022793A Silicon and oxygen ion co-implantation for metallic gettering in epitaxial wafers Electricity 46 Expired
US8043907B2 Atomic layer deposition processes for non-volatile memory devices Electricity 38 Active
US7659158B2 Atomic layer deposition processes for non-volatile memory devices Electricity 18 Active
US6888104B1 Thermally matched support ring for substrate processing chamber Electricity 18 Expired
US6374150B2 Method and apparatus for monitoring and/or end point detecting a process Electricity 8 Expired
US6569749B1 Silicon and oxygen ion co-implanation for metallic gettering in epitaxial wafers Electricity 7 Expired
US10892180B2 Lift pin assembly Chemistry; Metallurgy 5 Active
US8109669B2 Temperature uniformity measurement during thermal processing Physics 5 Active
US9888528B2 Substrate support with multiple heating zones Electricity 4 Active
US9779971B2 Methods and apparatus for rapidly cooling a substrate Electricity 3 Active
US11555244B2 High temperature dual chamber showerhead Chemistry; Metallurgy 2 Active
USD997893S1 Shadow ring lift plate General 1 Active
US11201078B2 Substrate position calibration for substrate supports in substrate processing systems Electricity 1 Active
USD1089130S1 Process chamber manifold General 0 Active
USD1009817S1 Shadow ring lift pin General 0 Active
US12315746B2 Bottom cover plate to reduce wafer planar nonuniformity Electricity 0 Active
US11955381B2 Low-temperature plasma pre-clean for selective gap fill Electricity 0 Active
US12228395B2 Substrate position calibration for substrate supports in substrate processing systems Performing Operations; Transporting 0 Active
US11939668B2 Gas delivery for tungsten-containing layer Chemistry; Metallurgy 0 Active
US10199204B2 Target retaining apparatus Electricity 0 Active
US12016092B2 Gas distribution ceramic heater for deposition chamber Electricity 0 Active
US11721542B2 Dual plasma pre-clean for selective gap fill Electricity 0 Active
US11955319B2 Processing chamber with multiple plasma units Electricity 0 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.