Dien-Yeh Wu
61Patents
17h-index
113Co-inventors
87Inventor score
Filing activity: Dec 21, 2001 → Mar 8, 2024
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6916398B2 | Gas delivery apparatus and method for atomic layer deposition | Electricity | 560 | Expired |
| US7204886B2 | Apparatus and method for hybrid chemical processing | Chemistry; Metallurgy | 471 | Expired |
| US7780789B2 | Vortex chamber lids for atomic layer deposition | Electricity | 427 | Active |
| US7591907B2 | Apparatus for hybrid chemical processing | Chemistry; Metallurgy | 350 | Active |
| USRE47440E1 | Apparatus and method for providing uniform flow of gas | General | 343 | Active |
| US6905541B2 | Method and apparatus of generating PDMAT precursor | Emerging Cross-Sectional Technologies | 85 | Expired |
| US6955211B2 | Method and apparatus for gas temperature control in a semiconductor processing system | Electricity | 54 | Expired |
| US7850779B2 | Apparatus and process for plasma-enhanced atomic layer deposition | Electricity | 51 | Active |
| US7780785B2 | Gas delivery apparatus for atomic layer deposition | Emerging Cross-Sectional Technologies | 51 | Expired |
| US7402210B2 | Apparatus and method for hybrid chemical processing | Chemistry; Metallurgy | 42 | Active |
| US7228873B2 | Valve design and configuration for fast delivery system | Emerging Cross-Sectional Technologies | 41 | Expired |
| US7066194B2 | Valve design and configuration for fast delivery system | Emerging Cross-Sectional Technologies | 39 | Expired |
| US7270709B2 | Method and apparatus of generating PDMAT precursor | Emerging Cross-Sectional Technologies | 36 | Expired |
| US7682946B2 | Apparatus and process for plasma-enhanced atomic layer deposition | Electricity | 35 | Active |
| US8070879B2 | Apparatus and method for hybrid chemical processing | Chemistry; Metallurgy | 24 | Active |
| US7699023B2 | Gas delivery apparatus for atomic layer deposition | Emerging Cross-Sectional Technologies | 23 | Active |
| US8668776B2 | Gas delivery apparatus and method for atomic layer deposition | Electricity | 18 | Active |
| US7524374B2 | Method and apparatus for generating a precursor for a semiconductor processing system | Emerging Cross-Sectional Technologies | 16 | Expired |
| US7833358B2 | Method of recovering valuable material from exhaust gas stream of a reaction chamber | Emerging Cross-Sectional Technologies | 16 | Active |
| US7775508B2 | Ampoule for liquid draw and vapor draw with a continuous level sensor | Chemistry; Metallurgy | 15 | Active |
| US7597758B2 | Chemical precursor ampoule for vapor deposition processes | Emerging Cross-Sectional Technologies | 12 | Active |
| US7780788B2 | Gas delivery apparatus for atomic layer deposition | Electricity | 11 | Active |
| US8955547B2 | Apparatus and method for providing uniform flow of gas | Emerging Cross-Sectional Technologies | 11 | Active |
| US8491967B2 | In-situ chamber treatment and deposition process | Electricity | 10 | Active |
| US9032906B2 | Apparatus and process for plasma-enhanced atomic layer deposition | Electricity | 9 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.