Symmetric VHF source for a plasma reactor
US11587766B2 · kind B2 · utility
2Cited by
14References
15Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 21, 2021 |
| Grant date | Feb 21, 2023 |
| Priority date | — |
| Expiry date | Jun 21, 2041 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32834
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
The disclosure pertains to a capacitively coupled plasma source in which VHF power is applied through an impedance-matching coaxial resonator having a symmetrical power distribution.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.