Arc lamp with forming gas for thermal processing systems
US11721539B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Nov 23, 2021 |
| Grant date | Aug 8, 2023 |
| Priority date | — |
| Expiry date | Nov 23, 2041 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/48
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Apparatus, systems, and methods for processing workpieces are provided. An arc lamp can include a tube. The arc lamp can include one or more inlets configured to receive water to be circulated through the arc lamp during operation as a water wall, the water wall configured to cool the arc lamp. The arc lamp can include a plurality of electrodes configured to generate a plasma in a forming gas introduced into the arc lamp via the one or more inlets. The forming gas can be or can include a mixture of a hydrogen gas and an inert gas, the hydrogen gas in the mixture having a concentration less than 4% by volume. The hydrogen gas can be introduced into the arc lamp prior to generating the plasma. The arc lamp may be used for processing workpieces.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.