High temperature chemical vapor deposition lid
US11732358B2 · kind B2 · utility
0Cited by
34References
15Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 17, 2022 |
| Grant date | Aug 22, 2023 |
| Priority date | — |
| Expiry date | Aug 17, 2042 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/52
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Process chamber lids, processing chambers and methods using the lids are described. The lid includes a pumping liner with a showerhead, blocker plate and gas funnel positioned therein. A liner heater is positioned on the pumping liner to control temperature in the pumping liner. Gas is flowed into the gas funnel using a dead-volume free one-way valve with a remote plasma source.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.