Guiding device and associated system
US11822252B2 · kind B2 · utility
Assignee
Inventors
- Dzmitry Labetski
- Christianus Wilhelmus Johannes Berendsen
- Rui Miguel Duarte Rodreigues Nunes
- Alexander I. Ershov
- Kornelis Frits Feenstra
- Igor V. Fomenkov
- Klaus Hummler
- Arun Johnkadaksham
- Matthias Kraushaar
- Andrew David LaForge
- Marc Guy Langlois
- Maksim Loginov
- Yue Ma
- Seyedmohammad Mojab
- Kerim Nadir
- Alexander Shatalov
- John Tom Stewart, IV
- Henricus Gerardus Tegenbosch
- Chunguang Xia
Key dates
| Filing date | Jan 22, 2021 |
| Grant date | Nov 21, 2023 |
| Priority date | — |
| Expiry date | Jan 22, 2041 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05G2/0023
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An extreme ultraviolet radiation (EUV) source, including: a vessel having an inner vessel wall and an intermediate focus (IF) region; an EUV collector disposed inside the vessel, the EUV collector including a reflective surface configured to reflect EUV radiation toward the intermediate focus region, the reflective surface configured to directionally face the IF region of the vessel; a showerhead disposed along at least a portion of the inner vessel wall, the showerhead including a plurality of nozzles configured to introduce gas into the vessel; and one or more exhausts configured to remove gas introduced into the vessel, the one or more exhausts being oriented along at least a portion of the inner vessel wall so that the gas is caused to flow away from the EUV collector.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.