Multi-tier backside power delivery network for dense gate-on-gate 3D logic
US11830852B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 3, 2021 |
| Grant date | Nov 28, 2023 |
| Priority date | — |
| Expiry date | Jun 20, 2042 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2225/06544
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Aspects of the present disclosure provide a multi-tier semiconductor structure. For example, the multi-tier semiconductor structure can include a first power delivery network (PDN) structure, and a first semiconductor device tier disposed over and electrically connected to the first PDN structure. The multi-tier semiconductor structure can further include a signal wiring tier disposed over and electrically connected to the first semiconductor device tier, a second semiconductor device tier disposed over and electrically connected to the signal wiring tier, and a second PDN structure disposed over and electrically connected to the second semiconductor device tier. The multi-tier semiconductor structure can further include a through-silicon via (TSV) structure electrically connected to the signal wiring tier, wherein the TSV structure penetrates the second PDN structure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.