Topcoat compositions and photolithographic methods
US11846885B2 · kind B2 · utility
0Cited by
7References
4Claims
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Key dates
| Filing date | Dec 19, 2014 |
| Grant date | Dec 19, 2023 |
| Priority date | — |
| Expiry date | Dec 19, 2034 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/0271
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
Topcoat compositions are provided that can be used in immersion lithography to form photoresist patterns. The topcoat compositions include a solvent system that comprises 1) a first organic solvent represented by formula (I),
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.