Symmetric VHF source for a plasma reactor
US11935724B2 · kind B2 · utility
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15References
15Claims
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Key dates
| Filing date | Feb 13, 2023 |
| Grant date | Mar 19, 2024 |
| Priority date | — |
| Expiry date | Feb 13, 2043 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32834
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
The disclosure pertains to a capacitively coupled plasma source in which VHF power is applied through an impedance-matching coaxial resonator having a symmetrical power distribution.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.